NEMS-gated gain cell targets denser, more efficient embedded DRAM
Researchers from UC Berkeley, Samsung and Intel published a paper on a nanoelectromechanically gated gain-cell eDRAM. The design aims to fix limited retention, parasitic coupling and boosted write voltages in conventional gain cells.
- Paper appears in IEEE JXCDC, pp. 223–230, 2026
- NEMS gate replaces the access transistor in the gain cell
- Goal is high density and energy efficiency with better retention
- Authors: Finnan, Rhee, Ghani and King-Liu
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