Hardware2 hOctober 3, 2026, 07:31

Musk and Huang see China closing lithography gap by 2030

Elon Musk and Nvidia CEO Jensen Huang believe China will close its lithography gap by 2030. The view comes as ASML plans to scale EUV output beyond 110 units by 2028 while China develops its own advanced lithography systems.

Digitimes

Open source

Musk and Huang see China closing lithography gap by 2030

Musk and Huang predict China will close the lithography gap by 2030
ASML aims to ship more than 110 EUV systems a year by 2028
China is developing its own advanced lithography systems
TSMC locked in 3–6% wafer price hikes for 2027

#Nvidia#ASML#TSMC#China

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