ASML Rejects Elon Musk-Backed Particle Accelerator Chipmaking Tech, Doubles Down on 1,000W Laser-Produced Plasma Systems

ASML will not adopt free-electron laser (FEL) technology for EUV generation, which is backed by Elon Musk. The company will continue developing laser-produced plasma (LPP) sources, increasing power from 500 to 1000W and boosting tin droplet rate to 100,000 per second.

• ASML develops LPP EUV sources from 250W to 500W, targeting 1000W
• Tin droplet count in LPP system planned to increase to 100,000 per second
• FEL requires a particle accelerator, undulator, and complex beam distribution
• Per JPMorgan, ASML sees no reason to switch from LPP to FEL despite Musk's support