Hardware5 dSeptember 16, 2026, 18:30

Jensen Huang: China will develop advanced lithography tools by 2030

Nvidia CEO Jensen Huang said on the All-In podcast that China will develop its own advanced lithography systems by 2030, calling it 'just a matter of time.' China's SMEE currently mass-produces only 193-nm ArF dry scanners for 90-nm processes, and immersion scanners for 28 nm have not entered mass production.

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Jensen Huang: China will develop advanced lithography tools by 2030

Huang: China will get advanced lithography 'by 2030, just a matter of time'
SMEE mass-produces only 193-nm ArF dry scanners for 90-nm chips
28-nm immersion scanner not confirmed in mass production
China has no EUV scanner prototype, only a lab light source

#Nvidia#SMEE#ASML#Китай

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