Industry maps large-format 6x12-inch photomasks for 2031 pilot line

An eBeam Initiative survey of 85 luminaries from over 45 companies found 66% expect large-format masks of roughly 6x12 inches within a decade. TSMC and ASML have already announced an initiative targeting a 12-inch mask pilot line by 2031, citing about 40% better productivity for High-NA EUV.

• 66% of 85 luminaries expect large-format masks within a decade
• 12-inch mask pilot line targeted for 2031
• Large format offers up to 40% productivity gain without A/B stitching
• 68% expect mask-etch system purchases to rise over three years