AlixLabs tests APS pitch splitting on imec's NanoIC pilot line

Swedish equipment developer AlixLabs has begun a six-month evaluation of its Atomic Layer Etch Pitch Splitting (APS) technology on imec's NanoIC pilot line. APS splits a single pre-patterned feature into two lines, doubling pattern density and potentially cutting process steps versus SADP and SAQP.

• Six-month APS evaluation runs on imec's NanoIC pilot line
• APS doubles pattern density by splitting one feature into two lines
• Metrics include critical dimension, LER/LWR, pitch walking and defectivity
• AlixLabs plans to deploy its Sax Forma APS platform in high-volume manufacturing