Hardware1 hOctober 26, 2026, 04:17

Pt-W alloy proposed for thinner High-NA EUV mask absorbers

Researchers from the Chinese Academy of Sciences, Jilin University and other institutions published a paper evaluating a Pt-W alloy as an alternative low-n EUV mask absorber. The study examines film properties and imaging performance; it appeared in iScience in August 2026.

Semiconductor Engineering

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Pt-W alloy proposed for thinner High-NA EUV mask absorbers

Pt-W alloy studied as a low-n absorber for next-gen EUV masks
Paper published in iScience in August 2026
Film properties and imaging performance of the absorber assessed

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