Simulation predicts 10,000x terahertz power boost for N-polar GaN transistors
A numerical study of N-polar GaN transistors using Dyakonov-Shur plasma instability predicts up to 1,300 microwatts of room-temperature terahertz emission at a 100 nm gate. That is hundreds of times the sub-2 µW record for Ga-polar structures. The work by CAS Suzhou, NJUST and UESTC researchers appeared in Frontiers of Optoelectronics.
- N-polar structures reach 2DEG densities up to 5.3×10¹³ cm⁻² versus 1–2×10¹³ for Ga-polar
- Contact resistance drops to 0.16 Ω·mm from 0.27–0.35 Ω·mm in Ga-polar devices
- Plasma oscillations vanish entirely at a 250 nm gate length
- Thickening the channel from 20 to 40 nm shifts frequency up by about 0.6 THz
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