ASML unveils Hyper NA EUV successor targeting 5nm single exposure

Engineers from ASML and optical partner Zeiss published a research paper in the October issue of the Journal of Micro/Nanopatterning, Materials and Metrology, formally disclosing Hyper NA EUV. The next-generation lithography aims to print 5nm chips in a single exposure.

• ASML and Zeiss disclosed Hyper NA EUV in a research paper
• The technology targets 5nm in a single exposure
• The paper appeared in the October issue of the Journal of Micro/Nanopatterning