Carl Zeiss and ASML propose Hyper-NA EUV with 0.75+ numerical aperture

Researchers at Carl Zeiss SMT and ASML published a technical paper on Hyper-NA EUV lithography with a numerical aperture of at least 0.75 as the next step beyond 0.55-NA High-NA systems. The work covers optical architecture, resolution potential, reticle 3D effects, polarization and requirements for extending the existing EUV ecosystem.

• Hyper-NA EUV targets numerical aperture of at least 0.75 vs 0.55 for High-NA
• Paper published in the Journal of Micro/Nanopatterning, Materials, and Metrology
• Covers optics, resolution, reticle 3D effects and polarization
• Assesses requirements for extending the EUV ecosystem