Siemens and Nvidia speed up AI chip lithography by 12x

Siemens has expanded its collaboration with Nvidia, integrating the cuLitho GPU acceleration library with its Calibre software for optical proximity correction. Full-chip OPC runs up to 12x faster and lithography simulations 10–17x faster, easing a key bottleneck for High-NA EUV and AI chip production.

• Full-chip OPC accelerated up to 12x using Nvidia's cuLitho GPU library
• Lithography simulations run 10–17x faster, per verified Siemens data
• Speedup makes curvilinear ILT practical for High-NA EUV lithography
• Targets chipmakers and photomask suppliers to cut turnaround times