Siemens and NVIDIA accelerate lithography for next-gen AI chips

Siemens announced progress in its collaboration with NVIDIA on computational lithography for manufacturing advanced AI semiconductors. NVIDIA's cuLitho library is integrated with Siemens Calibre software to speed up photomask optimization.

• Siemens integrated NVIDIA's cuLitho library into its Calibre software
• The goal is faster computational lithography for AI chip production
• Focus is on photomask optimization for advanced process nodes